Development of Fabrication Technology for MOS-Based Power Switching Devices in SiC
Date Published: 1997-06-18
Paper Number:971236
DOI: 10.4271/971236
Citation:
Cooper, J., "Development of Fabrication Technology for MOS-Based Power Switching Devices in SiC," SAE Technical Paper 971236, 1997, doi:10.4271/971236.
Author(s):
James A. Cooper - Purdue Univ.
Abstract:
Power switching devices in the wide bandgap semiconductor silicon carbide (SiC) are under development in many laboratories in the United States, Europe, and Japan. Because SiC can be thermally oxidized to form SiO
2
, it is possible to construct MOS-based power devices such as power MOSFETs, IGBTs, and MCTs in this material. This paper outlines the technical challenges which must be overcome before MOS-based power switching devices in SiC can reach the commercial marketplace.
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