Diamond Chemical Vapor Deposition on Cutting Tools

Paper #:
  • 982876

Published:
  • 1998-11-09
Citation:
Barquete, D., de Resende, L., Corat, E., Trava-Airoldi, W. et al., "Diamond Chemical Vapor Deposition on Cutting Tools," SAE Technical Paper 982876, 1998, https://doi.org/10.4271/982876.
Pages:
8
Abstract:
1. ABSTRACTThe diamond thin films chemical vapor deposition (CVD) on sintered tungsten carbide (WC-Co) tools shows increasing interest in the technological research, due to rapid growing utilization of aluminum alloys, like Al-Si alloys, in the automotive industry. Sintered carbides, mainly diamond coated sintered carbides, are very suitable to machine aluminum alloys.The cobalt binder that accounts for the WC-Co substrate toughness degrades the interface film-substrate, catalyzing the formation of graphite preferentially to diamond during the deposition process. In addition, stresses are generated in the interface between WC-Co substrate and deposited diamond film due to thermal expansion mismatch. These two factors are a technological neck to large-scale production of diamond CVD coatings for machining tools.In this work, several interface pre-treatments were developed and applied resulting in high film-substrate adherence, adequate for machining tool purposes.
Access
Now
SAE MOBILUS Subscriber? You may already have access.
Buy
Select
Price
List
Download
$27.00
Mail
$27.00
Members save up to 40% off list price.
Share
HTML for Linking to Page
Page URL

Related Items

Technical Paper / Journal Article
2012-04-16
Technical Paper / Journal Article
1999-12-01
Technical Paper / Journal Article
2011-10-06